E-beam lithography for micro-/nanofabrication
نویسندگان
چکیده
منابع مشابه
Flexible Nanofabrication Equipment: E-beam Lithography System Based on SEM
Electron beam lithography (EBL) is widely used in nanoscale device fabrication and research due to high resolution and excellent flexibility. In this paper, nanometer EBL system based on scanning electron microscope (SEM) is introduced. Its main components include a modified SEM, a laser interferometer controlled stage, a versatile high speed pattern generator, and a fully functional and easyop...
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19 In this paper, the viability of directly exposing thin films of liquid poly(dimethylsiloxane) (PDMS) to elec20 tron beam (e-beam) irradiation using e-beam lithographic methods for the purpose of creating perma21 nent micro-scale components has been investigated. By exposing 1.1 lm thickness PDMS films to 22 doses in the range 10–50,000 lC/cm, it was discovered that the structure of the resul...
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ژورنال
عنوان ژورنال: Biomicrofluidics
سال: 2010
ISSN: 1932-1058
DOI: 10.1063/1.3437589